High quality shadow masks for top contact organic field effect transistors using deep reactive ion etching

TitleHigh quality shadow masks for top contact organic field effect transistors using deep reactive ion etching
Publication TypeJournal Article
Year of Publication2010
AuthorsAljada, Muhsen, Mutkins Karyn, Vamvounis George, Burn P. L., and Meredith Paul
JournalJournal of Micromechanics and Microengineering
Volume20
Issue7
Pagination075037
Date Published06/10
AbstractIn this paper, we demonstrate the fabrication of top-contact silicon shadow masks for organic field effect transistors (OFETs) using plasma deep reactive ion etching (DRIE). Over 50 parallel and interdigitated finger contact masks of 30 µm thickness have been created on a single silicon wafer, with lengths spanning from 6.5 to 60 µm and channel widths varying from 1000 to 50 000 µm. Unlike all other mask fabrication techniques to date, these shadow masks are inexpensive, reusable, have nanoscopically sharp edges and can be made with precise (nanoscale) control over various sizes and shapes. Because a large number of these masks can be made at the same time, they can act as a platform for researchers studying new organic materials and OFET structures. Top contact OFETs have been successfully fabricated using these masks with performances comparable if not superior to those made with standard lithography.
URLhttp://stacks.iop.org/0960-1317/20/i=7/a=075037